The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2011
Filed:
Nov. 13, 2007
Applicants:
Satoshi Nagai, Kawasaki, JP;
Kazuya Fukuhara, Tokyo, JP;
Masamitsu Itoh, Yokohama, JP;
Kenji Kawano, Yokohama, JP;
Satoshi Tanaka, Kawasaki, JP;
Inventors:
Satoshi Nagai, Kawasaki, JP;
Kazuya Fukuhara, Tokyo, JP;
Masamitsu Itoh, Yokohama, JP;
Kenji Kawano, Yokohama, JP;
Satoshi Tanaka, Kawasaki, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G02B 5/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photomask unit includes a mask substrate having patterns arranged at a pitch P; and a pellicle which protects the mask substrate, wherein the pellicle is configured so that transmittance of incident light of an incident angle θ (0°<θ<90°) is higher than transmittance of incident light of an incident angle 0°.