The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2011

Filed:

Dec. 03, 2008
Applicants:

Takehiro Seshimo, Kawasaki, JP;

Yoshiyuki Utsumi, Kawasaki, JP;

Yoshitaka Komuro, Kawasaki, JP;

Keita Ishiduka, Kawasaki, JP;

Akiya Kawaue, Kawasaki, JP;

Kyoko Ohshita, Kawasaki, JP;

Inventors:

Takehiro Seshimo, Kawasaki, JP;

Yoshiyuki Utsumi, Kawasaki, JP;

Yoshitaka Komuro, Kawasaki, JP;

Keita Ishiduka, Kawasaki, JP;

Akiya Kawaue, Kawasaki, JP;

Kyoko Ohshita, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract

There are provided a compound represented by a general formula (b1-1) shown below suitable as an acid generator for a resist composition, a compound represented by a general formula (I) shown below suitable as a precursor for the compound represented by the general formula (b1-1), an acid generator, a resist composition, and a method of forming a resist pattern. [Chemical Formula 1]X—Q—Y—SOM  (I)X—Q—Y—SOA  (b1-1)(wherein, Qrepresents a bivalent linking group or a single bond; Yrepresents an alkylene group which may contain a substituent group or a fluorinated alkylene group which may contain a substituent group; X represents an aromatic cyclic group of 5 to 30 carbon atoms which contains a fluorine atom and may contain a substituent group; Mrepresents an alkali metal ion; and Arepresents an organic cation.).


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