The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2011
Filed:
Sep. 08, 2008
Richard A. Dipietro, Campbell, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Sally A. Swanson, San Jose, CA (US);
Hoa D. Truong, San Jose, CA (US);
Richard A. DiPietro, Campbell, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Sally A. Swanson, San Jose, CA (US);
Hoa D. Truong, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Polymers for use in photoresist compositions include a repeat unit having a formula of: wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso that X and R are not part of the same ring system. Also disclosed are processes for patterning a relief image of the photoresist composition, wherein the photoresist composition has an outgassing rate of less than 6.5E+14 molecules/cm/s.