The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
May. 26, 2009
Yoshitaka Tsunashima, Yokohama, JP;
Seiji Inumiya, Yokohama, JP;
Yasumasa Suizu, Oita, JP;
Yoshio Ozawa, Yokohama, JP;
Kiyotaka Miyano, Yokohama, JP;
Masayuki Tanaka, Yokohama, JP;
Yoshitaka Tsunashima, Yokohama, JP;
Seiji Inumiya, Yokohama, JP;
Yasumasa Suizu, Oita, JP;
Yoshio Ozawa, Yokohama, JP;
Kiyotaka Miyano, Yokohama, JP;
Masayuki Tanaka, Yokohama, JP;
Kabushiki Kaisha Toshiba, Kawasaki-shi, JP;
Abstract
Claimed and disclosed is a semiconductor device including a transistor having a gate insulating film structure containing nitrogen or fluorine in a compound, such as metal silicate, containing metal, silicon and oxygen, a gate insulating film structure having a laminated structure of an amorphous metal oxide film and metal silicate film, or a gate insulating film structure having a first gate insulating film including an oxide film of a first metal element and a second gate insulating film including a metal silicate film of a second metal element.