The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2011

Filed:

Dec. 23, 2005
Applicants:

Johan Frederik Dijksman, Weert, NL;

Raymond Jacobus Knaapen, Helmond, NL;

Krassimir Todorov Krastev, Eindhoven, NL;

Sander Frederik Wuister, Eindhoven, NL;

Yvonne Wendela Kruijt-stegeman, Eindhoven, NL;

Ivar Schram, Weert, NL;

Inventors:

Johan Frederik Dijksman, Weert, NL;

Raymond Jacobus Knaapen, Helmond, NL;

Krassimir Todorov Krastev, Eindhoven, NL;

Sander Frederik Wuister, Eindhoven, NL;

Yvonne Wendela Kruijt-Stegeman, Eindhoven, NL;

Ivar Schram, Weert, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 35/08 (2006.01); B29C 59/02 (2006.01); B29C 41/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.


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