The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2011
Filed:
Mar. 24, 2008
Tomohiro Nishiwaki, Anpachi-gun, JP;
Kazushige Kaneko, Gifu, JP;
Tetsuya Yamada, Gifu, JP;
Yoji Nomura, Mizuho, JP;
Tomohiro Nishiwaki, Anpachi-gun, JP;
Kazushige Kaneko, Gifu, JP;
Tetsuya Yamada, Gifu, JP;
Yoji Nomura, Mizuho, JP;
Sanyo Electric Co., Ltd., Moriguchi, JP;
Sanyo Semiconductor Co., Ltd., Ora-gun, JP;
Abstract
Cracks are generated in a resist film part used to form an opening part in a photoreceptor part, whereby etching is performed as far as the inter-layer insulating film in unintended portions. In order to prevent this, the resist pattern used as an etching mask is formed in a shape that disperses the stress. The stress is generated because the resist is hardened by post baking after having been exposed and developed. In order to disperse the stress, the opening part of the resist pattern is formed in a planar shape that has no corners.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile