The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2011
Filed:
Apr. 28, 2006
Hee Cheol Kang, Yongin, KR;
Kazuo Furuno, Yongin, KR;
Han Ki Kim, Yongin, KR;
Myoung Soo Kim, Yongin, KR;
Hee Cheol Kang, Yongin, KR;
Kazuo Furuno, Yongin, KR;
Han Ki Kim, Yongin, KR;
Myoung Soo Kim, Yongin, KR;
Samsung Mobile Display Co., Ltd., Yongin, KR;
Abstract
A catalyst enhanced chemical vapor deposition (CECVD) apparatus is provided in which the showerhead and catalyst support are separated from each other. The CECVD apparatus has excellent spacing between the showerhead, catalyst wire and substrate and can be purged to prevent contaminants from forming on parts functioning at low temperatures. The CECVD apparatus comprises a reaction chamber, a showerhead for introducing reaction gas into the reaction chamber, a catalyst wire for decomposing the reaction gas, a catalyst support for supporting the catalyst wire, a substrate on which the decomposed gas is deposited, and a substrate support for supporting the substrate.