The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2011
Filed:
Dec. 04, 2006
Fernando Gustavo Tomasel, Fort Collins, CO (US);
Justin Mauck, Fort Collins, CO (US);
Andrew Shabalin, Fort Collins, CO (US);
Denis Shaw, Fort Collins, CO (US);
Juan Jose Gonzalez, Fort Collins, CO (US);
Fernando Gustavo Tomasel, Fort Collins, CO (US);
Justin Mauck, Fort Collins, CO (US);
Andrew Shabalin, Fort Collins, CO (US);
Denis Shaw, Fort Collins, CO (US);
Juan Jose Gonzalez, Fort Collins, CO (US);
Advanced Energy Industries, Inc., Fort Collins, CO (US);
Abstract
A system and method for preventing formation of a plasma-inhibiting substance within a plasma chamber is provided. In one embodiment, an apparatus that includes a barrier component configured to be disposed within a plasma chamber. The barrier component includes a wall that defines a plasma formation region where a chemically-reducing species is formed from a fluid. A portion of the wall is formed of a substance that is substantially inert to the chemically-reducing species. The wall prevents the chemically-reducing species from interacting with an inner surface of the plasma chamber to form a conductive substance. The barrier component also includes an opening in fluid communication with the plasma formation region. The fluid is introduced into the plasma formation region via the opening.