The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2011
Filed:
Sep. 23, 2008
Ting Tsui, Garland, TX (US);
Satyavolu S. Papa Rao, Garland, TX (US);
Haowen Bu, Plano, TX (US);
Robert Kraft, Plano, TX (US);
Ting Tsui, Garland, TX (US);
Satyavolu S. Papa Rao, Garland, TX (US);
Haowen Bu, Plano, TX (US);
Robert Kraft, Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The present invention facilitates semiconductor fabrication by providing methods of fabrication that selectively apply strain to multiple regions of a semiconductor device. A semiconductor device having one or more regions is provided (). A strain inducing liner is formed over the semiconductor device (). A selection mechanism, such as a layer of photoresist or UV reflective coating is applied to the semiconductor device to select a region (). The selected region is treated with a stress altering treatment that alters a type and/or magnitude of stress produced by the selected region ().