The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2011
Filed:
May. 08, 2006
Applicants:
Antonius Theodorus Anna Maria Derksen, Eindhoven, NL;
Erik Marie José Smeets, Prinsenbeek, NL;
David Christopher Ockwell, Waalre, NL;
Henricus Jozef Peter Lenders, Heibloem, NL;
Inventors:
Antonius Theodorus Anna Maria Derksen, Eindhoven, NL;
Erik Marie José Smeets, Prinsenbeek, NL;
David Christopher Ockwell, Waalre, NL;
Henricus Jozef Peter Lenders, Heibloem, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); H01L 21/76 (2006.01);
U.S. Cl.
CPC ...
Abstract
A masking apparatus for preventing irradiation of an outer region of a substrate during lithography is disclosed. The masking apparatus includes a mask that includes a plurality of discrete segments arranged to form a continuous ring shaped mask positioned between an outer region of a substrate and an illumination system.