The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2011

Filed:

Nov. 13, 2006
Applicants:

Avto Tavkhelidze, Tbilisi, GE;

Jonathan Sidney Edelson, Portland, OR (US);

Isaiah Watas Cox, Baltimore, MD (US);

Stuart Harbron, Berkhamsted, GB;

Inventors:

Avto Tavkhelidze, Tbilisi, GE;

Jonathan Sidney Edelson, Portland, OR (US);

Isaiah Watas Cox, Baltimore, MD (US);

Stuart Harbron, Berkhamsted, GB;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method is disclosed for the induction of a suitable band gap and electron emissive properties into a substance, in which the substrate is provided with a surface structure corresponding to the interference of electron waves. Lithographic or similar techniques are used, either directly onto a metal mounted on the substrate, or onto a mold which then is used to impress the metal. In a preferred embodiment, a trench or series of nano-sized trenches are formed in the metal.


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