The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2011
Filed:
Dec. 20, 2005
Yoshihiko Nagata, Gunma, JP;
Yoshihiko Nagata, Gunma, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
There is disclosed a pelliclefor photolithography comprising, a pellicle framefor constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface is anodized, and each content of sulfate ion, nitrate ion, chlorine ion, and organic acid (total of oxalic acid, formic acid, and acetic acid) is 1.1 ppm or less in elution concentration after immersed in 100 ml of pure water at 25° C. for 168 hours, per 100 cmof a surface area of the frame, and a pellicle filmthat is adhered to one end face of the frame. Thereby, there can be provided a pellicle that can effectively prevent haze from being generated on a mask substrate even in a photolithography process with a wavelength being shorter.