The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2011

Filed:

May. 23, 2008
Applicants:

Jun Watanabe, Akishima, JP;

Tetsujiro Tada, Akishima, JP;

Takashi Arahata, Akishima, JP;

Jun Tamura, Akishima, JP;

Moriaki Akazawa, Tokyo, JP;

Masaru Sakamoto, Itami, JP;

Takahiko Kawasaki, Tokyo, JP;

Inventors:

Jun Watanabe, Akishima, JP;

Tetsujiro Tada, Akishima, JP;

Takashi Arahata, Akishima, JP;

Jun Tamura, Akishima, JP;

Moriaki Akazawa, Tokyo, JP;

Masaru Sakamoto, Itami, JP;

Takahiko Kawasaki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 7/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

A circular polishing pad has grooves formed on the surface in a spiral pattern with its center point offset from the center of the pad. The spiral pattern is an Archimedean spiral pattern or a parabolic spiral pattern. A target object is polished by using such a polishing pad without oscillating the platen to which the polishing pad is pasted or the polishing head that holds the target object.


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