The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Feb. 23, 2007
Todd C Bailey, Poughkeepsie, NY (US);
Ryan P. Deschner, Poughkeepsie, NY (US);
Wai-kin LI, Beacon, NY (US);
Roger A. Quon, Rhinebeck, NY (US);
Todd C Bailey, Poughkeepsie, NY (US);
Ryan P. Deschner, Poughkeepsie, NY (US);
Wai-Kin Li, Beacon, NY (US);
Roger A. Quon, Rhinebeck, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of designing features on a semiconductor wafer. A design of active or functional features is provided for chiplets separated by kerf areas on the wafer. The method then includes determining pattern density of the chiplet features, and applying a pattern of spaced dummy features on chiplet area not covered by active or functional features, as well as in the kerf areas. The dummy features are uniformly expanded or reduced in size until a desired dummy feature pattern density is reached.