The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Mar. 13, 2007
Mark Smith, Austin, TX (US);
Robert Hardister, Austin, TX (US);
Mike Pochkowski, Round Rock, TX (US);
Amir Widmann, Sunnyvale, CA (US);
Elyakim Kassel, Misgav, IL;
Mike Adel, Zichron Ya'akov, IL;
Mark Smith, Austin, TX (US);
Robert Hardister, Austin, TX (US);
Mike Pochkowski, Round Rock, TX (US);
Amir Widmann, Sunnyvale, CA (US);
Elyakim Kassel, Misgav, IL;
Mike Adel, Zichron Ya'akov, IL;
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout are provided. One computer-implemented method for creating a metrology target structure design for a reticle layout includes simulating how one or more initial metrology target structures will be formed on a wafer based on one or more fabrication processes that will be used to form a metrology target structure on the wafer and one or more initial metrology target structure designs. The method also includes creating the metrology target structure design based on results of the simulating step.