The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Aug. 02, 2006
Shiow-hwei Hwang, Livermore, CA (US);
Tao-yi Fu, Fremont, CA (US);
Xiumei Liu, Santa Clara, CA (US);
Shiow-Hwei Hwang, Livermore, CA (US);
Tao-Yi Fu, Fremont, CA (US);
Xiumei Liu, Santa Clara, CA (US);
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
Systems configured to generate output corresponding to defects on a specimen and systems configured to generate phase information about defects on a specimen are provided. One system includes an optical subsystem that is configured to create interference between a test beam and a reference beam. The test beam and the reference beam are reflected from the specimen. The system also includes a detector that is configured to generate output representative of the interference between the test and reference beams. The interference increases contrast between the output corresponding to the defects and output corresponding to non-defective portions of the specimen.