The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2011

Filed:

Mar. 15, 2006
Applicants:

Hiroyuki Nagasaka, Kumagaya, JP;

Taro Yamamoto, Koshi, JP;

Osamu Hirakawa, Koshi, JP;

Inventors:

Hiroyuki Nagasaka, Kumagaya, JP;

Taro Yamamoto, Koshi, JP;

Osamu Hirakawa, Koshi, JP;

Assignees:

Nikon Corporation, Tokyo, JP;

Tokyo Electron Limited, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01); G03B 27/52 (2006.01); G03B 27/42 (2006.01); G03B 27/54 (2006.01); G03B 27/58 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate via a projection optical system and a liquid. The exposure apparatus includes a liquid supply device which supplies liquid onto the substrate from above the substrate through a first and second supply ports disposed in a vicinity of a projection area onto which the pattern image is projected, and a liquid recovery device which recovers liquid on the substrate from above the substrate through an inside recovery port disposed outside the first and second supply ports and an outside the second recovery port disposed outside the inside recovery port.


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