The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Mar. 27, 2009
Applicants:
Burn Jeng Lin, Hsinchu, TW;
Tsai-sheng Gau, Hsinchu, TW;
Chun-kuang Chen, Hsinchu, TW;
Ru-gun Liu, Hsinchu, TW;
Shinn Sheng Yu, Hsinchu, TW;
Jen Chieh Shih, Jhubei, TW;
Inventors:
Burn Jeng Lin, Hsinchu, TW;
Tsai-Sheng Gau, Hsinchu, TW;
Chun-Kuang Chen, Hsinchu, TW;
Ru-Gun Liu, Hsinchu, TW;
Shinn Sheng Yu, Hsinchu, TW;
Jen Chieh Shih, Jhubei, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract
Various seal ring arrangements for an immersion lithography system are disclosed. With the seal ring arrangements, the immersion lithography system can provide better sealing effect for processing the wafers on a wafer chuck.