The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Apr. 25, 2008
Mason Terry, Redwood City, CA (US);
Homer Antoniadis, Mountain View, CA (US);
Dmitry Poplavskyy, San Jose, CA (US);
Maxim Kelman, Mountain View, CA (US);
Mason Terry, Redwood City, CA (US);
Homer Antoniadis, Mountain View, CA (US);
Dmitry Poplavskyy, San Jose, CA (US);
Maxim Kelman, Mountain View, CA (US);
Innovalight, Inc., Sunnyvale, CA (US);
Abstract
A method of forming a diffusion region is disclosed. The method includes depositing a nanoparticle ink on a surface of a wafer to form a non-densified thin film, the nanoparticle ink having set of nanoparticles, wherein at least some nanoparticles of the set of nanoparticles include dopant atoms therein. The method also includes heating the non-densified thin film to a first temperature and for a first time period to remove a solvent from the deposited nanoparticle ink; and heating the non-densified thin film to a second temperature and for a second time period to form a densified thin film, wherein at least some of the dopant atoms diffuse into the wafer to form the diffusion region.