The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Dec. 21, 2006
Chia-chiang Chang, Taipei County, TW;
Chin-jyi Wu, Kaohsiung, TW;
Shin-chih Liaw, Hsinchu, TW;
Chun-hung Lin, Taipei, TW;
Chia-Chiang Chang, Taipei County, TW;
Chin-Jyi Wu, Kaohsiung, TW;
Shin-Chih Liaw, Hsinchu, TW;
Chun-Hung Lin, Taipei, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A plasma deposition apparatus is provided. The plasma deposition apparatus comprises a chamber. A pedestal is placed in the chamber. A plasma generator is placed in the chamber and over the pedestal. The plasma generator comprises a plasma jet for plasma thin film deposition having a discharge direction angle θof 0° to 90° between a normal direction of the pedestal and the discharge direction of the plasma jet. A gas-extracting apparatus is placed in the chamber and over the pedestal. The gas-extracting apparatus comprises a gas-extracting pipe providing a pumping path for particles and side-products having a pumping direction angle θof 0° to 90° between the normal direction of the pedestal and the pumping direction of the gas-extracting pipe.