The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Sep. 21, 2007
Joseph Yudovsky, Campbell, CA (US);
Brendan Mcdougall, Livermore, CA (US);
Ravi Jallepally, Santa Clara, CA (US);
Yi-chiau Huang, Fremont, CA (US);
Maitreyee Mahajani, Saratoga, CA (US);
Kevin Griffin, Livermore, CA (US);
Andrew C. Sherman, Byron, CA (US);
Joseph Yudovsky, Campbell, CA (US);
Brendan McDougall, Livermore, CA (US);
Ravi Jallepally, Santa Clara, CA (US);
Yi-Chiau Huang, Fremont, CA (US);
Maitreyee Mahajani, Saratoga, CA (US);
Kevin Griffin, Livermore, CA (US);
Andrew C. Sherman, Byron, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention generally provides method and apparatus for non-contact temperature measurement in a semiconductor processing chamber. Particularly, the present invention provides methods and apparatus for non-contact temperature measurement for temperature below 500° C. One embodiment of the present invention provides an apparatus for processing semiconductor substrates. The apparatus comprises a target component comprises a material with higher emissivity than the one or more substrates.