The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2011
Filed:
Jul. 06, 2007
Wenbing Yun, Walnut Creek, CA (US);
Yuxin Wang, Northbrook, IL (US);
Srivatsan Seshadri, Walnut Creek, CA (US);
Kenneth W. Nill, Lexington, MA (US);
Wenbing Yun, Walnut Creek, CA (US);
Yuxin Wang, Northbrook, IL (US);
Srivatsan Seshadri, Walnut Creek, CA (US);
Kenneth W. Nill, Lexington, MA (US);
Xradia, Inc., Pleasanton, CA (US);
Abstract
CD-GISAXS achieves reduced measurement times by increasing throughput using longer wavelength radiation (˜12×, for example) such as x-rays in reflective geometry to increase both the collimation acceptance angle of the incident beams and the scattering signal strength, resulting in a substantial combined throughput gain. This wavelength selection and geometry can result in a dramatic reduction in measurement time. Furthermore, the capabilities of the CD-GISAXS can be extended to meet many of the metrology needs of future generations of semiconductor manufacturing and nanostructure characterization, for example.