The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2011
Filed:
Mar. 30, 2005
Takashi Tanioka, Shibukawa, JP;
Katsuya Fukae, Shibukawa, JP;
Taisuke Yonemura, Chiyoda-ku, JP;
Kanto Denka Kogyo Co., Ltd., Tokyo, JP;
Abstract
The present invention provides processes and equipments for safely and easily preparing an F-containing gas, as well as processes and equipments for surface modification using the F-containing gas prepared. According to the present invention, a gas containing a fluoro compound that is easier to handle than Fis supplied and the fluoro compound is excited and decomposed to convert it into Fgas before surface modification and then used for surface modification. According to the present invention, there is no necessity of providing, storing and transporting a large amount of Fgas in advance because a necessary amount of Fgas is obtained immediately before surface modification. A process for preparing an F-containing gas comprises the steps of exciting at least one fluoro compound in a fluoro compound-containing gas by conferring energy on the fluoro compound-containing gas under reduced pressure; and partially or completely converting the excited fluoro compound-containing gas containing the excited fluoro compound into Funder normal pressure or overpressure.