The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2011
Filed:
Apr. 13, 2004
Wolfgang Singer, Aalen, DE;
Joachim Wietzorrek, Aalen, DE;
Joachim Hainz, Aalen, DE;
Gabriele Weirauch, Dresden, DE;
Manfred Maul, Aalen, DE;
Wolfgang Singer, Aalen, DE;
Joachim Wietzorrek, Aalen, DE;
Joachim Hainz, Aalen, DE;
Gabriele Weirauch, Dresden, DE;
Manfred Maul, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The present invention relates to an illumination system for microlithography, especially for wavelengths ≦193 nm, especially preferably for EUV lithography for illuminating a field in a field plane with at least one optical integrator which splits up a light bundle emitted by a light source into a plurality of light channels each having a light intensity, characterized in that a filter is provided in the light path from the light source to the field plane, with the filter comprising filter elements which are configured in such a way that the light intensity of at least one light channel is reduced in the light path after the filter element.