The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2011

Filed:

Feb. 28, 2008
Applicants:

David T. OR, Santa Clara, CA (US);

Yu Chang, San Jose, CA (US);

William Kuang, San Francisco, CA (US);

Joel M. Huston, San Jose, CA (US);

Chien-teh Kao, Sunnyvale, CA (US);

Mei Chang, Saratoga, CA (US);

Inventors:

David T. Or, Santa Clara, CA (US);

Yu Chang, San Jose, CA (US);

William Kuang, San Francisco, CA (US);

Joel M. Huston, San Jose, CA (US);

Chien-Teh Kao, Sunnyvale, CA (US);

Mei Chang, Saratoga, CA (US);

Assignee:

Applied Materials, Inc, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 10/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for controlling power output of a capacitatively-coupled plasma are provided. A detector is disposed on the power delivery conduit carrying power to one electrode to detect fluctuations in power output to the electrode. The detector is coupled to a signal generator, which converts the RF input signal to a constant control signal. A controller adjusts power input to the RF generator by comparing the control signal to a reference.


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