The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2011

Filed:

Feb. 28, 2008
Applicants:

Fei Wang, Newark, CA (US);

Scott C. J. Tseng, Fremont, CA (US);

Xiaojia Wang, Fremont, CA (US);

Kai-chia Feng, San Mateo, CA (US);

Haiyan Gu, Fremont, CA (US);

Hongmei Zang, Sunnyvale, CA (US);

Rong-chang Liang, Cupertino, CA (US);

Inventors:

Fei Wang, Newark, CA (US);

Scott C. J. Tseng, Fremont, CA (US);

Xiaojia Wang, Fremont, CA (US);

Kai-Chia Feng, San Mateo, CA (US);

Haiyan Gu, Fremont, CA (US);

HongMei Zang, Sunnyvale, CA (US);

Rong-Chang Liang, Cupertino, CA (US);

Assignee:

SiPix Chemical Inc., Taoyuan County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 7/12 (2006.01); B32B 15/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

This invention relates to a composition suitable for the formation of a release layer in an in-mold decoration or thermal transfer printing process. The invention also relates to a process for the formation of a release layer comprising dispersing or dissolving the release layer composition of the present invention in a solvent followed by curing said composition.


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