The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
Feb. 04, 2008
Tsutomu Tetsuka, Kasumigaura, JP;
Naoshi Itabashi, Hachioji, JP;
Atsushi Itou, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The invention provides a method for detecting and managing the status of a plasma processing apparatus with high sensitivity so as to enable long-term stable processing. In a plasma processing apparatus comprising a vacuum processing chamber, a plasma generating high frequency power supplyand a measurement device unitfor estimating the status of the apparatus via reflected wavesof the incident wavesreflected from the processing apparatus including a waveform generator, a VCO, a directional coupler, a detectorand a measurement data processing unit, frequency-swept high frequency wavesfor measurement are introduced to the processing chamber where no plasma discharge is performed, so as to monitor the change of absorption spectrum frequency of the reflected wavesto thereby monitor the change in status of the processing apparatus.