The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2011

Filed:

Feb. 28, 2007
Applicants:

Hideo Suzuki, Funabashi, JP;

Takayuki Tamura, Funabashi, JP;

Kentaro Ohmori, Funabashi, JP;

Inventors:

Hideo Suzuki, Funabashi, JP;

Takayuki Tamura, Funabashi, JP;

Kentaro Ohmori, Funabashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 73/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed are a polyamic acid containing not less than 10 mol % of a repeating unit represented by the formula [1] below, and a polyimide represented by the formula [2] below which is obtained from such a polyamic acid. The polyamic acid and polyimide have high heat resistance as shown by a thermal decomposition temperature of not less than 300° C. In addition, the polyamic acid and polyimide have good workability because of their high solubility in solvents, while exhibiting good light transmission. (In the formula, Rand Rindependently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms; Rand Rindependently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms or a phenyl group, or alternatively Rand Ron adjacent carbon atoms may combine together to form a cycloalkyl group having 3 to 8 carbon atoms or a phenyl group; Rrepresents a divalent organic group; and n represents an integer of not less than 2.)


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