The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Jul. 09, 2007
Manjusha Mehendale, Princeton, NJ (US);
Michael J. Kotelyanskii, Chatham, NJ (US);
Yanwen Hou, Hackettstown, NJ (US);
Jim Onderko, Gibsonia, PA (US);
Guray Tas, Flanders, NJ (US);
Manjusha Mehendale, Princeton, NJ (US);
Michael J. Kotelyanskii, Chatham, NJ (US);
Yanwen Hou, Hackettstown, NJ (US);
Jim Onderko, Gibsonia, PA (US);
Guray Tas, Flanders, NJ (US);
Rudolph Technologies, Inc., Flanders, NJ (US);
Abstract
A method includes selecting one of performing ellipsometry or performing optical stress generation and detection. The method also includes, in response to selecting performing ellipsometry, applying at least one first control signal to a controllable retarder that modifies at least polarization of a light beam, and performing ellipsometry using the modified light beam. The method further includes, in response to selecting performing optical stress generation and detection, applying at least one second control signal to the controllable retarder, and performing optical stress generation and detection using the modified light beam. Apparatus and computer readable media are also disclosed.