The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Feb. 14, 2007
Michiko Nakaya, Nirasaki, JP;
Michiko Nakaya, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A processing method includes a silicon oxide etching process of performing a plasma etching on a target layer mainly made up of silicon, a silicon oxide layer formed on the target layer and a target object having a previously patterned resist layer formed on the silicon oxide layer, the plasma etching of the silicon oxide layer being performed by using the resist layer as a mask; a deposits removing process of removing deposits generated in the silicon oxide etching process and stuck to the target object; and a silicon etching process of performing a plasma etching on the target layer by a plasma generated from a processing gas containing SF, Oand SiFwhile using the silicon oxide layer as a mask.