The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
May. 23, 2005
Applicants:
Stephan Bradl, Köfering, DE;
Klaus Kerkel, Neutraubling, DE;
Christine Lindner, Pyrbaum, DE;
Inventors:
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method is described in which a contact hole () to an interconnect () in an insulating layer () is fabricated. A barrier layer () is subsequently applied. Afterward, a photoresist layer () is applied, irradiated and developed. With the aid of a galvanic method, a copper contact () is then produced in the contact hole (). Either the barrier layer () or an additional boundary electrode layer () serves as a boundary electrode in the galvanic process. Critical metal contaminations are minimized in production.