The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
May. 07, 2010
Sri M. Sri-jayantha, Ossining, NY (US);
Hien P. Dang, Nanuet, NY (US);
Vijayeshwar D. Khanna, Millwood, NY (US);
Arun Sharma, New Rochelle, NY (US);
Sri M. Sri-Jayantha, Ossining, NY (US);
Hien P. Dang, Nanuet, NY (US);
Vijayeshwar D. Khanna, Millwood, NY (US);
Arun Sharma, New Rochelle, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A pattern matched pair of a front metal interconnect layer and a back metal interconnect layer having matched thermal expansion coefficients are provided for a reduced warp packaging substrate. Metal interconnect layers containing a high density of wiring and complex patterns are first developed so that interconnect structures for signal transmission are optimized for electrical performance. Metal interconnect layers containing a low density wiring and relatively simple patterns are then modified to match the pattern of a mirror image metal interconnect layer located on the opposite side of the core and the same number of metal interconnect layer away from the core. During this pattern-matching process, the contiguity of electrical connection in the metal layers with a low density wiring may become disrupted. The disruption is healed by an additional design step in which the contiguity of the electrical connection in the low density is reestablished.