The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Dec. 11, 2006
Applicant:
Kiyofumi Yamamoto, Kanagawa, JP;
Inventor:
Kiyofumi Yamamoto, Kanagawa, JP;
Assignee:
Fujifilm Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/78 (2006.01);
U.S. Cl.
CPC ...
Abstract
To a transparent substrate () on which a plurality of spacers () are formed, an infrared cut filter (IRCF) substrate () is attached. The IRCF substrate () has a coefficient of thermal expansion smaller than the transparent substrate () and approximately equal to a wafer (). Next, the transparent substrate () is diced into plural pieces to form a plurality of cover glasses (). Then heat cure adhesive () is coated on each spacer () and the spacers () are attached on the wafer () on which a plurality of light receiving section () and pads () are previously formed. Finally, the heat cure adhesive () is heated to be cured.