The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Sep. 23, 2004
Wu-song Huang, Poughkeepsie, NY (US);
Marie Angelopoulos, Cortlandt Manor, NY (US);
Timothy A. Brunner, Ridgefield, CT (US);
Dirk Pfeiffer, Dobbs Ferry, NY (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Wu-Song Huang, Poughkeepsie, NY (US);
Marie Angelopoulos, Cortlandt Manor, NY (US);
Timothy A. Brunner, Ridgefield, CT (US);
Dirk Pfeiffer, Dobbs Ferry, NY (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A radiation-sensitive composition (and method of fabricating a device using the composition) includes a nonpolymeric silsesquioxane including at least one acid labile moiety, a polymer including at least one member selected from the group consisting of an aqueous base soluble moiety and an acid labile moiety, and a radiation-sensitive acid generator. Another radiation-senstive composition (and method of fabricating a device using the composition) includes a nonpolymerc silsesquioxane including at least one aqueous base soluble moiety, a polymer including an aqueous base soluble moiety, a crosslinker, and a radiation-sensitive acid generator.