The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Jun. 19, 2009
Richard Kevin Bailey, Newark, DE (US);
Graciela Beatriz Blanchet, Wilmington, DE (US);
Jonathan V Caspar, Wilmington, DE (US);
John Catron, Jr., Smyrna, DE (US);
Reid John Chesterfield, Santa Barbara, CA (US);
Thomas C. Felder, Kennett Square, PA (US);
Feng Gao, Hockessin, DE (US);
Lynda Kaye Johnson, Wilmington, DE (US);
Roupen Leon Keusseyan, Raleigh, NC (US);
Dalen E. Keys, Landenberg, PA (US);
Irina Malajovich, Swarthmore, PA (US);
Jeffrey Scott Meth, Landenberg, PA (US);
Geoffrey Nunes, Swarthmore, PA (US);
Gerard O'neil, Newark, DE (US);
Rinaldo Soria Schiffino, Wilmington, DE (US);
Nancy G. Tassi, Gibbstown, NJ (US);
Richard Kevin Bailey, Newark, DE (US);
Graciela Beatriz Blanchet, Wilmington, DE (US);
Jonathan V Caspar, Wilmington, DE (US);
John Catron, Jr., Smyrna, DE (US);
Reid John Chesterfield, Santa Barbara, CA (US);
Thomas C. Felder, Kennett Square, PA (US);
Feng Gao, Hockessin, DE (US);
Lynda Kaye Johnson, Wilmington, DE (US);
Roupen Leon Keusseyan, Raleigh, NC (US);
Dalen E. Keys, Landenberg, PA (US);
Irina Malajovich, Swarthmore, PA (US);
Jeffrey Scott Meth, Landenberg, PA (US);
Geoffrey Nunes, Swarthmore, PA (US);
Gerard O'Neil, Newark, DE (US);
Rinaldo Soria Schiffino, Wilmington, DE (US);
Nancy G. Tassi, Gibbstown, NJ (US);
E.I. du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
Metal compositions including silver compositions are used in preparing thermal imaging donors. The donors are useful for thermal transfer patterning of a metal layer and optionally, a corresponding proximate portion of an additional transfer layer onto a thermal imaging receiver. The compositions are useful for dry fabrication of electronic devices. Also provided are patterned multilayer compositions comprising one or more base film(s), and one or more patterned metal layers, including EMI shields and touchpad sensors.