The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Apr. 25, 2006
David Albertalli, Santa Clara, CA (US);
Robert G. Boehm, Jr., Livermore, CA (US);
Oleg N. Gratchev, San Jose, CA (US);
James N Middleton, Brentwood, CA (US);
Perry West, Los Gatos, CA (US);
David Albertalli, Santa Clara, CA (US);
Robert G. Boehm, Jr., Livermore, CA (US);
Oleg N. Gratchev, San Jose, CA (US);
James N Middleton, Brentwood, CA (US);
Perry West, Los Gatos, CA (US);
ULVAC, Inc., Kanagawa, JP;
Abstract
A drop analysis/drop check system allows a plurality of printheads to remain stationary during analysis to emulate operation of an actual piezoelectric microdeposition system. The system provides accurate tuning of individual nozzle ejectors and allows for substrate loading and alignment in parallel with drop analysis/drop check. The drop analysis/drop check system includes a motion controller directing movement of a stage, a printhead controller controlling a printhead to selectively eject drops of fluid material to be deposited on a substrate, and a camera supported by the stage for movement relative to the printheads. The camera receives a signal from the motion controller to initiate exposure of the camera and captures an image of the drops of fluid material ejected by the printheads. A light-emitting device includes a strobe controller that receives a signal from the camera to supply light to an area including the liquid drops during camera exposure.