The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
May. 29, 2007
Hayato Kimura, Shizuoka, JP;
Yujin Handa, Shizuoka, JP;
Seiji Wake, Shizuoka, JP;
Takuya Matsukawa, Shizuoka, JP;
Seiichi Tsuchiya, Shizuoka, JP;
Hayato Kimura, Shizuoka, JP;
Yujin Handa, Shizuoka, JP;
Seiji Wake, Shizuoka, JP;
Takuya Matsukawa, Shizuoka, JP;
Seiichi Tsuchiya, Shizuoka, JP;
NuFlare Technology, Inc., Numazu-shi, JP;
Abstract
A pattern writing circuit self-diagnosis method for a charged beam photolithography apparatus and a charged beam photolithography apparatus which enable to maintain normality of the charged beam photolithography apparatus are provided. The pattern writing circuit self-diagnosis method for a charged beam photolithography apparatus is a pattern writing circuit self-diagnosis method for a charged beam photolithography apparatus which irradiates a charged beam on a target sample to write a desired pattern. Layout information and a pattern writing conditions which is prepared in advance are input to the pattern writing circuit, and processing result data of the pattern writing circuit output as a result of the inputting is collected. The collected processing result data of the pattern writing circuit is compared with correct data. The charged beam photolithography apparatus has means which realizes the pattern writing circuit self-diagnosis method.