The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
Jul. 03, 2008
Alan Michael Chandler, Milton, VT (US);
Tushar Desai, South Burlington, VT (US);
Ellis Craig Hayford, Williston, VT (US);
Nicholas Mone, Jr., Essex Junction, VT (US);
James Spiros Nakos, Essex Junction, VT (US);
Alan Michael Chandler, Milton, VT (US);
Tushar Desai, South Burlington, VT (US);
Ellis Craig Hayford, Williston, VT (US);
Nicholas Mone, Jr., Essex Junction, VT (US);
James Spiros Nakos, Essex Junction, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of improving the performance of charged beam apparatus. The method including: providing the apparatus, the apparatus comprising: a chamber having an interior surface; a pump port for evacuating the chamber; a substrate holder within the chamber; and a charged particle beam within the chamber, the charged beam generated by a source and the charged particle beam striking the substrate; and positioning one or more liners in contact with one or more different regions of the interior surface of the chamber, the liners preventing material generated by interaction of the charged beam and the substrate from coating the one or more different regions of the interior surface of the chamber.