The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2011

Filed:

Jul. 29, 2008
Applicants:

Timothy W. Kemerer, Essex Junction, VT (US);

Jenifer E. Lary, Hinesburg, VT (US);

James S. Nakos, Essex Junction, VT (US);

Steven M. Shank, Jericho, VT (US);

Inventors:

Timothy W. Kemerer, Essex Junction, VT (US);

Jenifer E. Lary, Hinesburg, VT (US);

James S. Nakos, Essex Junction, VT (US);

Steven M. Shank, Jericho, VT (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of manufacturing a dual contact trench capacitor is provided. The method includes forming a first plate provided within a trench and isolated from a wafer body by a first insulator layer formed in the trench. The method further includes forming a second plate provided within the trench and isolated from the wafer body and the first plate by a second insulator layer formed in the trench.


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