The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2011

Filed:

Aug. 13, 2008
Applicants:

Chi-liang Pan, Keelung, TW;

Min-lin Lee, Hsinchu, TW;

Shinn-juh Lai, Hsinchu County, TW;

Shih-hsien Wu, Taoyuan County, TW;

Chen-hsuan Chiu, Taipei, TW;

Inventors:

Chi-Liang Pan, Keelung, TW;

Min-Lin Lee, Hsinchu, TW;

Shinn-Juh Lai, Hsinchu County, TW;

Shih-Hsien Wu, Taoyuan County, TW;

Chen-Hsuan Chiu, Taipei, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H05F 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An ESD protection structure is provided. A substrate includes a first voltage variable material and has a first surface, a second surface substantially paralleled to the first surface and a via connecting the first and second surfaces. A first metal layer is disposed in the substrate for coupling to a ground terminal. The first voltage variable material is in a conductive state when an ESD event occurs, such that the via is electrically connected with the first metal layer to form a discharge path, and the first voltage variable material is in an isolation state when the ESD event is absent, such that the via is electrically isolated from the first metal layer.


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