The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Mar. 14, 2007
Applicants:
Alex Oudshoorn, Woerden, NL;
Roland Blok, Eindhoven, NL;
Inventors:
Alex Oudshoorn, Woerden, NL;
Roland Blok, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
A device manufacturing method includes exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, determining a non-linear function for approximating a height and a tilt profile of a surface of the reticle with respect to the reticle stage, and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function.
Quick Actions:
Oudshoorn, Alex. (2011). Device manufacturing method, lithographic apparatus, and a computer program (U.S. Patent No. 7894038). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7894038
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile