The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Jun. 22, 2006
Shigeki Nojima, Yokohama, JP;
Yoko Oikawa, Tokyo, JP;
Satoshi Tanaka, Kawasaki, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A method for verifying mask pattern data includes preparing design circuit data on a design circuit which realizes a desired electrical operation. Data on a design circuit pattern having a structure which realizes the design circuit on a semiconductor substrate is prepared. Mask pattern data on a pattern of a mask used in order to produce the design circuit pattern is prepared. A circuit pattern which is to be obtained by processing a film using the pattern of the mask indicated by the mask pattern data is acquired. Circuit data on a circuit realized by at least a first part of the circuit pattern is produced. A circuit mismatch part where the circuit data and a part of the design circuit data which corresponds to the first part of the circuit pattern do not match up is detected.