The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
May. 15, 2006
Wilhelmus Petrus DE Boeij, Veldhoven, NL;
Simon DE Groot, Eindhoven, NL;
Ewoud Vreugdenhil, Valkenswaard, NL;
Johannes Wilhelmus DE Klerk, Eindhoven, NL;
Wilhelmus Petrus De Boeij, Veldhoven, NL;
Simon De Groot, Eindhoven, NL;
Ewoud Vreugdenhil, Valkenswaard, NL;
Johannes Wilhelmus De Klerk, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to identify a pattern characteristic property which is non uniformly distributed over the area of the die. If the distribution is found to be asymmetric, a line separating the die area into two half-die areas is defined with respect to which the asymmetry is apparent. Half-die areas of different dies with the same pattern characteristic property are grouped together in the mask pattern. The resulting enhanced symmetry of the distribution of the pattern characteristic property over the mask area increases lithographic processability and thereby improves die yield.