The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Mar. 23, 2006
Willem Herman Gertruda Anna Koenen, Roermond, NL;
Willem Herman Gertruda Anna Koenen, Roermond, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A calibration method to calibrate a substrate table position in a lithographic apparatus, the method including repeatedly irradiating a pattern onto a surface of the substrate so as to create a two dimensional arrangement of patterns on the surface of the substrate, the irradiating including displacing the substrate table between successive irradiations to irradiate the pattern onto different locations on the surface of the substrate, reading out the patterns in the two dimensions to obtain pattern read out results, deriving incremental position deviations from the read out results of neighboring patterns in dependency on the position of the substrate table in the two dimensions, deriving from the incremental position deviations a position error of the substrate table as a function of the two dimensional position of the substrate table and calibrating the position of the substrate table using the position dependent position error.