The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Jun. 20, 2008
Costel Biloiu, Rockport, MA (US);
Craig R. Chaney, Rockport, MA (US);
Eric R. Cobb, Danvers, MA (US);
Bon-woong Koo, Andover, MA (US);
Wilhelm P. Platow, Somerville, MA (US);
Costel Biloiu, Rockport, MA (US);
Craig R. Chaney, Rockport, MA (US);
Eric R. Cobb, Danvers, MA (US);
Bon-Woong Koo, Andover, MA (US);
Wilhelm P. Platow, Somerville, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced intothe source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits.