The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
May. 07, 2007
Teruo Iwata, Nirasaki, JP;
Teruo Iwata, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A deposition apparatus supplies a reactive gas obtained by vaporizing a liquid material at a vaporizerinto a chambervia a processing-gas pipeand forms a thin film on a semiconductor wafer W due to a thermal decomposition of the reactive gas. The deposition apparatus is provided, in the processing-gas pipe, with a crystal gaugedetecting a pressure Pq under the influence of mist in the reactive gas and a capacitance manometerdetecting a pressure Pg under no influence of the mist. The apparatus further includes a gasification monitordetecting a quantity of mist in the reactive gas on the basis of a difference ΔP between the pressure Pq and the pressure Pg measured by the crystal gaugeand the capacitance manometerin order to prevent deposition defects due to the mist in the reactive gas.