The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7884920 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 08, 2011

Filed:

Jun. 15, 2007
Applicants:

Hermanus Mathias Joannes Rene Soemers, Mierlo, NL;

Felix Godfried Peter Peeters, Lieshout, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

A mirror assembly to interact with a beam of radiation of a lithographic apparatus is disclosed. The mirror assembly includes a mirror, a piezo electric actuator, and a mover structure, the mover structure connected to the mirror, an assembly of the mirror and the mover structure being pivotable about a pivot point, the piezo electric actuator having a contacting surface to establish a slip-stick contact with the mover structure.


Find Patent Forward Citations

Soemers, Hermanus Mathias Joannes Rene. (2011). Lithographic apparatus and pivotable structure assembly (U.S. Patent No. 7884920). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7884920

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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