The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2011
Filed:
May. 20, 2009
Tadashi Hattori, Utsunomiya, JP;
Tadashi Hattori, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes a first measurement device, a second measurement device, and a controller. The first measurement device measures the position of a substrate stage in the optical axis direction when the substrate stage is scanned in the first direction. The second measurement device measures the surface positions of the substrate in the optical axis direction at a plurality of measurement points on one straight line extending in the second direction on the substrate. The controller controls the second measurement device to measure at least one identical region on the substrate at different measurement points of the plurality of measurement points both before and after the substrate stage moves in steps in the second direction, and calculates a measurement error of the first measurement device attributed to the driving of the substrate stage in the second direction based on the measurement result obtained by the second measurement device.