The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2011
Filed:
May. 29, 2007
Erwan Le Roy, Newark, CA (US);
Chun-cheng Tsao, Cupertino, CA (US);
Theodore R. Lundquist, Milpitas, CA (US);
Rajesh Kumar Jain, San Jose, CA (US);
Erwan Le Roy, Newark, CA (US);
Chun-Cheng Tsao, Cupertino, CA (US);
Theodore R. Lundquist, Milpitas, CA (US);
Rajesh Kumar Jain, San Jose, CA (US);
DCG Systems, Inc., Fremont, CA (US);
Abstract
An apparatus and method for processing an integrated circuit employing optical interference fringes. During processing, one or more wavelength lights are directed on the integrated circuit and based upon the detection of interference fringes and characteristics of the same, further processing may be controlled. One implementation involves charged particle beam processing of an integrated circuit as function of detection and/or characteristics of interference fringes. A charged particle beam trench milling operation is performed in or on the substrate of an integrated circuit. Light is directed on the floor of the trench. Interference fringes may be formed from the constructive or destructive interference between the light reflected from the floor and the light from the circuit structures. Resulting fringes will be a function, in part, of the thickness and/or profile of the trench floor. Milling may be controlled as a function of the detected fringe patterns.