The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2011
Filed:
Aug. 21, 2006
Applicants:
Akira Kodashima, Nirasaki, JP;
Shinichi Miyano, Nirasaki, JP;
Takehiro Kato, Nirasaki, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
Abstract
A substrate processing apparatus which enables the work efficiency of maintenance to be improved. The substrate processing apparatus comprises a plurality of processing chambersfor carrying out plasma processing on a wafer to be processed. Each processing chamberhas a chamber lidthat can be suspended and supported by a crane unit. The crane unitcomprises an air cylinderand a linear guide. The air cylinderholds the chamber lidmovably in a vertical direction thereabove. The linear guideholds the chamber lidmovably in a horizontal direction.